International Research journal of Management Science and Technology

  ISSN 2250 - 1959 (online) ISSN 2348 - 9367 (Print) New DOI : 10.32804/IRJMST

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ENHANCING TOPOLOGICAL PROPERTIES USING CHEMICAL DOPING STRATEGIES

    1 Author(s):  DR. ALOK SHRIVASTAVA

Vol -  17, Issue- 1 ,         Page(s) : 73 - 89  (2026 ) DOI : https://doi.org/10.32804/IRJMST

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Abstract

Chemical doping represents a powerful and versatile approach to engineer and enhance the topological properties of quantum materials, enabling precise control over electronic structure, Fermi level positioning, and surface state characteristics without disrupting the fundamental topological protection mechanisms.


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