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ENHANCING TOPOLOGICAL PROPERTIES USING CHEMICAL DOPING STRATEGIES
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Author(s):
DR. ALOK SHRIVASTAVA
Vol - 17, Issue- 1 ,
Page(s) : 73 - 89
(2026 )
DOI : https://doi.org/10.32804/IRJMST
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Abstract
Chemical doping represents a powerful and versatile approach to engineer and enhance the topological properties of quantum materials, enabling precise control over electronic structure, Fermi level positioning, and surface state characteristics without disrupting the fundamental topological protection mechanisms.
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